We put a lot of effort to maintain fine grain size with great uniformity on our targets. Besides regular target specification we also develop customized targets.
- Sputtering Targets are commoly used in semiconductor and optoelectronic industries.
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Based on customer’s requirement and equipment size, we provide varies material/ purity/ size targets.
Main product portfolio and specifications
TARGET MATERIAL TYPES |
|
Planar Target- Pure Metal |
Al、Cu、Cr、Mo、Nb、Ni、Si、Ti、Ta、W |
Planar Target- Alloy |
AlNd、AlNiLa、AlNiCuLa、AZO、ITO、MoLa、MoNb、MoW、NiAl、NiCr、Niv、NiCu、NiMo、SiAl、TiAl、ZnAl、ZnSn |
Rotary Target | Ag、Al、AlNd、Cu、Cr、ITO、Mo、MoNb、Nb、NbOx、Ni、Niv、 Si、SiAl、Sn、Ti、TiOx、Ta、W、ZnAl、ZnSn |
If you have any other requirements, please contact us. |