We put a lot of effort to maintain fine grain size with great uniformity on our targets. Besides regular target specification we also develop customized targets.

  • Sputtering Targets are commoly used in semiconductor and optoelectronic industries.

  • Based on customer’s requirement and equipment size, we provide varies material/ purity/ size targets.

Main product portfolio and specifications
TARGET MATERIAL TYPES
Planar Target-
Pure Metal 		Al、Cu、Cr、Mo、Nb、Ni、Si、Ti、Ta、W
Planar Target-
Alloy 		AlNd、AlNiLa、AlNiCuLa、AZO、ITO、MoLa、MoNb、MoW、NiAl、NiCr、Niv、NiCu、NiMo、SiAl、TiAl、ZnAl、ZnSn
Rotary Target Ag、Al、AlNd、Cu、Cr、ITO、Mo、MoNb、Nb、NbOx、Ni、Niv、 Si、SiAl、Sn、Ti、TiOx、Ta、W、ZnAl、ZnSn
If you have any other requirements, please contact us.