Sputtering Target
Sputtering Targets are commoly used in semiconductor and optoelectronic industries.
Based on customer's requirement and equipment size, we provide varies material/ purity/ size targets.
We put a lot of effort to maintain fine grain size with great uniformity on our targets. Besides regular target specification we also develop customized targets.
| TARGET MATERIAL TYPES |
| Planar Target | Pure Metal | Al、Cu、Cr、Mo、Nb、Ni、Si、Ti、Ta、W |
| Alloy | Al Alloy、ITO、MoLa、Mo Alloy、MoW、NiAl、NiCr、Niv、NiCu、NiMo、SiAl、TiAl、ZnAl、ZnSn | |
| For special alloy target, please contact us. | ||
| Rotary Target | Ag、Al、Cu、Cr、ITO、Mo、MoNb、Nb、NbOx、Ni、Niv、 Si、SiAl、Sn、Ti、TiOx、Ta、W、ZnAl、ZnSn | |
| If you have any other requirements, please contact us |
